Schematic diagram of self-stabilizing luminescence system built with vertically integrated devices. Credit: Prof. Sun’s team

A team led by Prof. Sun Haiding from the University of Science and Technology of China (USTC) developed a vertically integrated micro-scale light-emitting diode (micro-LED) array which was then applied in deep ultraviolet (DUV) maskless photolithography system for the first time. Their study was published in Laser & Photonics Reviews.

Photolithography plays a crucial role in the manufacture of integrated circuit chips and is on…